Clean Technology Supporting Semiconductor Manufacturing Process. The Ultraclean Technology for Semiconductor Manufacturing.

نویسندگان

چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

In-situ Process Control for Semiconductor Manufacturing

There is a critical need for exact, real-time reaction control of the chemical vapor deposition (CVD) systems that are used for semiconductor device manufacture [1]. At present, the development of real-time control for reactions within production-style reactor configurations is hampered by a number of issues: The nature, concentrations and physical distributions of the chemical species within t...

متن کامل

TiCl4 Barrier Process Engineering in Semiconductor Manufacturing

Titanium nitride (TiN) not only was utilized in the wear-resistant coatings industry but it was also adopted in barrier processes for semiconductor manufacturing. Barrier processes include the titanium (Ti) and TiN processes, which are commonly used as diffusion barriers in via/contact applications. However, engineers frequently struggle at the via/contact module in the beginning of every techn...

متن کامل

nchmarking Semiconductor Manufacturing

We are studying the manufacturing performance of semiconductor wafer fabrication plants in the US, Asia, and Europe. There are great similarities in production equipment, manufacturing processes, and products produced at these plants. Nevertheless, data reported here show that important quantitative measures of productivity vary by factors of 3 to as much as 5 across an international sample of ...

متن کامل

Inspection in Semiconductor Manufacturing

In-line microscopy must keep up with the flow of manufacturing. At an inspection point, of which there are several in the process stream, a fraction of the wafers will be inspected, typically on the order of 20%. The fraction of wafers inspected depends on the maturity of the process, the complexity of the product, and the particular process step being monitored. State-of-the-art inline imaging...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Journal of the Surface Finishing Society of Japan

سال: 1999

ISSN: 0915-1869,1884-3409

DOI: 10.4139/sfj.50.848